The Phoenix is a turnkey multi-cathode DC / RF magnatron sputtering system capable of handling high throughput production environments Cathodes up to 60" Long Multi-Chamber, Multi-Process Design Available in vertical or horizontal configurations to best utilize your production requirements, floor space, and workflow. Scalable The modular design allows you to easily increase production capabilities or add deposition technologies as your requirements change. Phoenix® Brochure (Requires PDF reader)

Powerful Control System available in semi-manual mode or in fully automatic mode with one push automation to reduce system downtime. Process Pro Upgrade Offers: Consistent controls across all Denton Vacuum Products Standard software makes it easy to support and avoid costly customization fees Source code for your programs so you can customize your programs. Network capabilities makes the discovery a node on your network enabling real-time, remote support and upgrades. Multiple Pumping Configurations A variety of diffusion, cryogenic, and turbo pump configurations are available to fit your budget and process. Rear or bottom fitted pumps provide easy access for service based on your workspace needs.

Typical Applications PECVD Materials Research Small Batch Systems 3D Objects Coat a Variety of Materials Sputtering Process Development Hard Coatings Semiconductor & MEMs Interlayer Dielectric Passivation Layers Production Nanotechnology Medical Devices OLEDs Protective Coatings

Options	Sputtering	PECVD
Closed loop carrier return system
In-situ optical transmission monitoring
Plasma emission monitoring for reactive processes
Automated loading and unloading
External buffering cassettes
Linear ion source for substrate cleaning
Pump Options
Diffusion
Cryogenic
Turbo
Dry scroll
Oil free