The Helios is Denton Vacuum’s batch production PECVD system. The Helios has the ability to handle substrates up to 31” x 61” with easy access doors on both sides. Features Batch Process Handles Substrates up to 31" x 61" Doors open on both ends for easy access High Quality Stainless Steel or Aluminum Chambers Harsh Duty Dry Pump for Process Gases Fully Automated, State of the Art Process Control Real Time Remote Monitoring Clean Room Compatible Turbomolecular Pumping   Helios® Brochure (Requires PDF reader)

Powerful Control System available in semi-manual mode or in fully automatic mode with one push automation to reduce system downtime. Process Pro Upgrade Offers: Consistent controls across all Denton Vacuum Products Standard software makes it easy to support and avoid costly customization fees Source code for your programs so you can customize your programs. Network capabilities makes the discovery a node on your network enabling real-time, remote support and upgrades.

Typical Applications PECVD Materials Research Large Batch Production 3D Objects Coat a Variety of Materials

Options	PECVD
Very High Frequency RF (40.68 MHz)
Preheat and Cool Down Chambers
Carrier Carts