The addition of the Voyager to Denton Vacuum's range of deposition platforms provides the thin film specialist with the ability to deposit a variety of films previously difficult to produce due to the geometry of the part or the extended deposition period required. The Voyager utilizes proven hardware configurations developed by Denton Vacuum. The result is a robust mechanical package supported by established controls for ease of operation and intuitive recipe building. Designed to meet the thin film industry’s requirements for conformal coatings, low temperature processing and high intrinsic uniformity, the Voyager offers Plasma Enhanced Chemical Vapor Deposition on a convenient platform. Benefits of PECVD processes include an unlimited source of deposition material and the ability to produce defined stresses in the film.   Voyager® Brochure (Requires PDF reader)

Powerful Control System available in semi-manual mode or in fully automatic mode with one push automation to reduce system downtime. Process Pro Upgrade Offers: Consistent controls across all Denton Vacuum Products Standard software makes it easy to support and avoid costly customization fees Source code for your programs so you can customize your programs. Network capabilities makes the discovery a node on your network enabling real-time, remote support and upgrades. Convenient Access to Subsystems Rear or bottom mounted pumps provide easy access for service based on your workspace needs Multiple Pumping Configurations A variety of diffusion, cryogenic, and turbo pump configurations are available to fit your budget and process. Rear or bottom fitted pumps provide easy access for service based on your workspace needs.

Typical Applications PECVD Materials Research Small Batch Systems 3D Objects Coat a Variety of Materials Sputtering Process Development Hard Coatings Amorphous Si Optical Interference Coatings Semiconductor & MEMs Interlayer Dielectric Passivation Layers Common Deposition Materials TiN SiO2 SiN TiO2 DLC

Options	Sputtering	PECVD
Turbo pump
RF biased, water cooled substrate stage
Distributed gas
Capacitance monometer
Load lock
Sputter cathode and power supplies
Ion source and power supplies
Alternative gas delivery: vapor source
Electron beam gun
Pump Options
Diffusion
Cryogenic
Turbo
Dry scroll
Oil free