Discovery® 550 Multi-Wafer Loading System

After the release last year of the Discovery® 550 Clean Room Sputtering System, Denton Vacuum is continuing with its efforts to configure systems that meet the requirements of the semiconductor world, with their recently manufactured, Multi-Wafer Loading, Discovery® Sputtering System.

Aimed at the semiconductor and research markets, this new configuration from Denton has it all; multi-wafer, continuous processing, substrate etching capabilities, substrate RF Bias for film integrity and multi-material depositions. This unit will handle 6”or 8” substrates, with current loading volume of eight substrates. The result is a tool that affords the industry, “cluster tool functionality at batch processing prices”.

The four magnetron design, and integration of a 5cm DC Source, provides the capability of wafer conditioning and depositions in a single vacuum environment. The multi-wafer loadlock system supports the tool for R&D or production manufacturing. The system can be configured for metal and dielectric sputtering or co-depositions, as required.

Denton has recently provided the Discovery® 550 to a leading East Coast university. Selection of Denton was hard fought and represents recognition of our established manufacturing experience and process understanding for this leading-edge technology.

The Denton Vacuum Discovery® System’s modular design has allowed users with the capability to expand as their requirements develop. For many years, the Discovery® platform has been widely accepted. Yet again, the latest Discovery® platform is meeting the new technical challenges.

For more information, call (856) 439-9100 FAX: (856) 439-9111, E-mail info@dentonvacuum.com, or write Denton Vacuum, Inc., 1259 North Church Street, Moorestown, NJ 08057 USA.