Performance of a Radio Frequency Plasma Ion Source

Plasma ion source capable of:

• High productivity
  • High ion current density over large coverage areas.
  • Suitable for high capacity planetary and domed calotte systems.
• Low cost of ownership
  • Single grid design enables quick and easy maintenance with no grid alignment.
  • No auxiliary electron source (filament or hollow cathode) required for discharge or neutralization.
  • Long production campaigns with no maintenance required.
• Deposited films exhibit low absorption and scattering losses.
  • Independent control of ion beam current density and ion energy to enable optimization of process conditions to a wide range of optical films materials.