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As integral as throughput is when it comes to meeting production needs, there is no single answer for improving throughput, especially across different deposition methods. With both evaporation and magnetron sputtering, there are a number of factors you need to consider in order to raise your total throughput. Improving Throughput in Magnetron Sputtering With a… Read More
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When comparing the four main types of physical vapor deposition (PVD) for thin films, it is important to know the benefits and drawbacks of each before you decide which method will best suit your application. PVD can occur through sputtering (magnetron or ion beam), which utilizes energetic ions colliding with a target to eject (or… Read More
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In indium bump deposition, there is a tradeoff between closure rate and closure uniformity. A slower closure rate and high closure uniformity is ideal, but often, the closer you get to your desired specs in one area, the more you sacrifice with the other. Closure Rate vs. Closure Uniformity Closure rate: This refers to the… Read More
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Thin film coatings serve a number of purposes for different applications, including across the opto-electronics, display, semiconductor and medical fields. Here is a quick rundown of a number of common coatings that are available, their properties, and the applications they’re optimized for in order to help you figure out the best coating for your performance… Read More
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Grain size refers to the size of the individual crystallites or particles that compose a solid metal. Grain size, as well as the boundaries between the grains, are important factors for determining physical properties of the entire metal. In thin film deposition, if the particles are deposited with high energy, and there is a high… Read More
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With today’s technological advances, higher pixel density in focal plane arrays is a necessity as demand for improved visual quality goes up. Because of this, feature sizes on focal plane arrays are getting smaller, which requires higher density interconnects to bond the detector array to the readout chip. The current electroplating process just can’t deliver… Read More
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Ion beam deposition (IBD) is a thin film deposition method that produces the highest quality films with excellent precision. Also referred to as ion beam sputtering (IBS), it’s a process that’s used when tight control over film thickness and stoichiometry is needed. How it Works During the ion beam deposition process, an ion source is… Read More
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By adding an in-situ control or ion source to your thin film deposition system, you can achieve better performance and results, including higher yield and increased ROI. But how do you know which control choice is the right system addition for your application? In-Situ Controls In-situ controls allow you to observe the formation of thin… Read More
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There are several common types of thin film deposition techniques, with varying benefits depending on the method. But it’s not just the method that matters. Deposition source placement is one factor that can have a significant effect on thin film deposition. For sputtering, different cathode placement options can lead to different results for the thin… Read More
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Throughout the monitoring process, the system manufacturer and thin film engineer have several process choices to make regarding a number of factors. How do the different monitoring options affect the level of precision? Quartz Crystal vs. Optical Monitors Quartz crystal monitoring (QCM) is used to measure physical thickness while optical monitoring systems (OMS) measure optical… Read More