The Infinity Biased Target sputter module is designed to enable advanced process control and closed-loop control of film properties for high-performance thin films even at a high throughput. In conventional IBS systems, the long path of high-energy ions between the source and the substrate leads to scatter. However, with the Infinity Biased Target system, high-energy ions only exist near the target, eliminating beam overspill.
Because of its low operating pressure and low ion energy, the Infinity Bias Target sputter module is the ideal solution for next-generation high TCR focal plane arrays, and laser bar facet coatings. This sputter module can be integrated with any front-end option, ranging from a single load lock to our Versa cluster tool, for improved throughput and scalability.