Infinity LL (Load Lock) Etch

Ion Beam Etch

Load lock etch system

The Denton Vacuum LL (Load Lock) Etch System enables high-performance etching, critical thin film profile milling, glancing angle milling and more. This flexible solution is designed to support high-throughput processing for demanding, high-volume applications like pilot production and foundry support in the semiconductor, data storage, MEMS, and wafer processing markets.

System features include an industry-leading ion beam source, an integrated Secondary Ionization Mass Spectrometer (SIMS) for endpoint detection, advanced Semiconductor Layer Stop Technology (SLST), automatic layer termination software and fully-automatic sample transfer with load lock, enabling a high throughput.

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Applications

  • Semiconductor process yield improvement with end point control
  • Compound semiconductor Au etch
  • Process control and chip design assessment
  • Patterned etch
  • Wafer processing service

Benefits

The Infinity LL Etch is class 1000 cleanroom compatible (ballroom style), ESD compliant and chemical assist is available for etch . It can be configured for either single chip or multiple chip. Denton Vacuum’s experts will work with you to ensure that your configuration is optimized to meet your exact needs and specifications, and your system will be fully supported by our technical team.

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