Phoenix Thin Film Deposition Solution

In-Line Magnetron & PE-CVD Sputtering

Phoenix sputtering system

The Phoenix in-line system offers high throughput for large volume production, and supports both planar and 3D component processing. This thin film deposition system can accommodate RF, AC, DC and pulsed DC sputtering as well as PE-CVD processes, and substrates or pallets up to GEN 3.5 glass size (600mm X 720mm). The Phoenix in-line automation conveys a flat pallet or carrier through the system’s linear chambers. The system can be configured with Denton’s proprietary optical process control system or color control system (patent pending).

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  • Wafer metallization
  • 3D medical device coatings
  • AR & conductive transparent coatings
  • Front & back contacts for photovoltaics
  • Composite dielectric coatings
  • Discrete & hybrid circuit metallization


An automated, inline palletized conveyor system creates uniformly thick and highly homogeneous coatings, ideally suited for both challenging layer stacks and simple product mixes. Can be configured with planar or cylindrical cathodes. The width and length of cathodes are optimized to meet your process performance and throughput requirements. The Phoenix inline palletized conveyance (IPC) system provides users optimal uniform coating thicknesses and highly homogeneous coatings. The IPC system includes six distinct stations or chambers, including: intake into atmosphere, dual interlocked pre-process buffer, two-chamber pump-down process, dual interlocked buffer post-process and outtake out to atmosphere.