Infinity Biased Target Sputter Module

Ion Beam Deposition

The Bias Target sputter module offers excellent control of thin film interfaces by using a graduated energy process to control the energies striking the thin film surface. This eliminates contamination and scatter from beam overspill, and also prevents surface damage. It also provides independent control over ion currents and energies, enabling tight stress control.

The system operates at a low pressure which creates dense, defect-free films. Improved target usage allows you to reduce the overall target size, improving cost of ownership. Compared to conventional IBS and physical vapor deposition methods, the system design makes it possible to achieve excellent uniformity on large substrates without rotation. The Bias Target sputter module offers a higher deposition rate compared to other IBD platforms and also allows for pulsed sputtering.

All of these unique features and benefits are supported by Denton Vacuum’s commitment to reliable solutions and continuous improvement. As with all Denton systems, our team of experts will configure your Bias Target module to meet your needs and specifications.


  • Vanadium oxide processing
  • Focal plane arrays
  • Thermal imaging
  • IR detectors
  • Laser bar facets
  • VCSELs (vertical-cavity surface-emitting lasers)

How It Works

The Infinity Biased Target sputter module is designed to enable advanced process control and closed-loop control of film properties for high-performance thin films even at a high throughput. In conventional IBS systems, the long path of high-energy ions between the source and the substrate leads to scatter. However, with the Infinity Biased Target system, high-energy ions only exist near the target, eliminating beam overspill.

Because of its low operating pressure and low ion energy, the Infinity Bias Target sputter module is the ideal solution for next-generation high TCR focal plane arrays, and laser bar facet coatings. This sputter module can be integrated with any front-end option, ranging from a single load lock to our Versa cluster tool, for improved throughput and scalability.

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