How It Works
The Discovery V is a fast uniform deposition module , integrated fully on the Versa platform using a planar cathode for magnetron sputtering . It utilizes 300mm cathode and can be used for standard up to 200mm wafer applications. It employs an adjustable rotating magnet pack for uniformity optimization and provides high rates for high volume manufacturing.
In a planar cathode configuration, the cathode is mounted directly above the substrate. With this configuration, you can gain tight uniformity on one side of the substrate during sputtering for properties such as film thickness, sheet resistance and refractive index. It’s the ideal configuration for applications where co-sputtering is not a requirement. This cathode set-up also offers improved yield, good lift-off capability and a high deposition rate.
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