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Voyager PIB-CVD

Plasma Ion Beam Assisted Chemical Vapor Deposition (PIB-CVD)

Voyager PIB-CVD

The Voyager PIB-CVD is a plasma ion beam assisted Chemical Vapor Deposition (PIB-CVD) system built around the filament-free Endeavor RF Ion Source. This patented ion source, by design, has independent control of both ion current density and ion energy over a wide range, capable of producing high deposition rate multi-layer coatings. It is able to deposit high rate, high quality coatings at low temperature (below 100°C), making it compatible with typical plastic substrates such as polycarbonate (PC) and polymethylmethacrylate (PMMA).

The Voyager PIB-CVD system was designed with a focus on diamond-like nanocomposite (DLN) to provide best-in-class flexibility to coat planar (ex. silicon wafers), and three-dimensional parts (ex. optical lenses). The system is configured with Denton’s Process Pro control system, allowing for automated and manual process control.

In addition, there is an optional proprietary chamber configuration to enable co-sputtering during DLN deposition for DLN (Me-DLN) films. This configuration is unique in the industry and opens up the potential to develop novel DLN films with tailorable mechanical, electrical, and tribological properties.


The Voyager PIB-CVD platform provides diamond-like nanocomposite (DLN) films for:

  • Flexible and scratch-resistant displays
  • Wear coatings for medical & commercial products
  • IR transparent protective films
  • Hydrophobic coatings

How It Works

The low operating temperature of the Voyager PIB-CVD makes it compatible with plastic substrates. The inherent tune-ability of the PIB-CVD technology provides tremendous flexibility in thin film deposition, supporting not only flowable, soft, thin film encapsulation layers but also for hard, highly hydrophobic, and optically clear coatings.

Its single, low-maintenance source is inherently clean, as the reactive gases are delivered outside of the source body. This provides high uptime by design.

The Voyager PIB-CVD system is fully compatible with all front-end options, including the Versa cluster architecture, to scale into high-volume manufacturing.

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