Both the Voyager PE-CVD and the Voyager PIB-CVD systems are designed to provide cutting edge DLC and DLN solutions for relatively small components, or up to 200mm wafers.
Both Voyager systems are fully compatible with all front-end options, including the Versa cluster architecture, to scale into high-volume manufacturing. The systems are configured with Denton’s Process Pro control system, allowing for automated and manual process control and tune-ability.
The Voyager PIB-CVD is based around Denton’s patented linear ion source, which enables a new class of thin film deposition called Plasma Ion Beam CVD (PIB-CVD) that can be tuned to produce coating compositions ranging from polymer-like to a diamond-like coating (DLC).
The ion source behind PIB-CVD allows the ion energies and oxygen ratio to be adjusted to suit the needs of a wide range of applications, not only for flowable, soft, thin film encapsulation layers but also for hard, highly hydrophobic, and optically clear coatings.