Enabling Innovation in Plasma Ion Energy Control for Thin Film Deposition and Etch
With 28 patents and proprietary technologies centered around ion energy and plasma control, Denton Vacuum is uniquely capable of helping semiconductor and nanotech companies meet their needs for low damage, contamination free, ultra thin and uniform films to keep them on their technology roadmaps.
For 60 years, we have pioneered the thin film industry helping engineers solve their biggest problems with advanced technology, production worthy equipment and unparalleled customer service. Our ion energy plasma control for thin film deposition and etch technologies and production proven tools reliably deliver consistent, repeatable results. Discover how our solutions can solve your challenges.
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About Denton Vacuum
Denton Vacuum’s thin film deposition technologies provide superior performance in applications such as precision optics, lift-off and step coverage, dual-sided laser facet coating, indium for wafer level packaging, diamond-like carbon, metallization and medical coatings.
We’ve been enabling innovation in thin film since 1964.
Recent News
- Denton Vacuum Celebrates 60 Years of Leadership in Thin Film Deposition in the Optoelectronics Industry
- Denton Vacuum Receives Phoenix Order for Green Energy
- Denton Vacuum Announces New Order for Second Infinity Biased Target Ion Beam Deposition System
Recent Posts
- Denton Research: Overcoming the Scalability Problems of Quantum Device Manufacturing
- Improving Liftoff with Collimation Control
- The Impact of Grain Size on Thin Film Performance
- The “Scallop” Problem: Overcoming the Hidden Thin Film Challenges of the AI and Quantum Revolution