Denton Vacuum: Experts in Thin Film Deposition and Etch Technology

Dr. David Douglass, VP Marketing and Technology interview

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Denton Vacuum is a leading supplier of process equipment for manufacturing semiconductor and opto-electronic devices focusing on innovative technology and application-specific configurations. Partner with Process Experts In our video, hear from Denton’s own Dr. David Douglass, Vice President of Marketing and Technology, as he details the advantages of application-specific configurations over engineered-to-order systems. This provides… Read More

Make Pre-Owned Equipment Part of Your Total Design Solution

Scientist working on silicon wafer fabrication in cleanroom

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At the end of every fiscal year, many companies take advantage of surplus capital before their budget is set for the upcoming year. In an ever-changing business landscape, it’s crucial to maximize your capex budget in as many areas as possible. To do this while increasing your factory output, choose the thin film deposition process… Read More

Denton Vacuum Infinity FA Tool

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Enable uniform removal of the entire layer regardless of chemical composition The Infinity FA from Denton Vacuum is optimized for delayering applications. The Infinity FA can utilize multiple etch technologies for uniform removal of layers. This high-performance etch tool is designed for delayering finished or in-process integrated circuits for failure analysis or reverse engineering. Learn… Read More

Denton Vacuum: Enabling Innovation in Thin Film Deposition and Etch

Interview with Frank Cumbo, President and CEO of Denton Vacuum

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Join Frank Cumbo, President and CEO of Denton Vacuum, as he discusses the promising future of the company. Denton Vacuum is seeing great success in many markets ranging from semiconductors, optoelectronics, and IR detectors to display, microanalysis, and sample preparation. Hear more about their plan to stay competitive as chip production ramps up and where… Read More

Plasma Ion Beam Chemical Vapor Deposition (PIB-CVD): A New Class of Thin Film Deposition

Interview with Ravindranath Viswan

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PIB-CVD is a groundbreaking thin film deposition technology with a wide range of tunability, scalability, and durability. A primary feature of PIB-CVD is that the ion current density and the ion energy can both be independently controlled without the need for substrate biasing or additional grids. To learn more about the configurations, treatments, and other… Read More

Versatile, Turnkey Solutions for Magnetron Sputtering


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Denton offers a number of magnetron configurations to meet different application requirements. Magnetron sputtering is a highly versatile thin film deposition technique for coating films with excellent adhesion and high density. Magnetron sputtering is a plasma-based coating process where a magnetically confined plasma is created near the surface of a target material. Positively charged energetic… Read More

Pre-Cleaning in Thin Film Deposition

Woman in scrubs cleaning a thin film

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The global physical vapor deposition market is expected to expand at a compound annual growth rate (CAGR) of 7.5% from 2022 to 2030. The increasing demand for this process is due to the technological advancements in the industry. PVD films are used in applications for solar cells, optical & electrical components, automobiles, wear coatings, energy… Read More

The Benefits of Bias Target Sputtering

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Enabling Sputtering from the Target Only Bias Target Sputtering (BTS) has excellent process control and stoichiometry while reducing contamination and lowering cost of ownership. The ultralow contamination leads to higher performance in lasers and fewer defects enables higher laser damage threshold. BTS is also used for EUV mask blanks which must be defect-free or the… Read More

Denton’s Versa Cluster Platform Enables Greater Thin Film Production Efficiency

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The Versa cluster platform is an automated front-end option for high-volume manufacturing for thin film deposition operation with Denton’s ProcessPro-HV software. Versa is designed to work with 200 mm or 300 mm process modules and is compatible with Discovery sputter modules and the Voyager PE-CVD system. This cluster platform has features dedicated to sputter etch… Read More

Why PIB-CVD? Process Tunability

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The process tunability of PIB-CVD makes it optimal for many thin film applications. The inherent tunability of PIB-CVD enables a wide range of film properties including flowable, soft, thin film encapsulation layers as well as hard, highly hydrophobic, and optically clear coatings. As a result, multilayer and gradient coatings can be produced in a single chamber from… Read More