Sputtering

A physical vapor deposition process that uses ion bombardment to eject material from a target onto a substrate

Denton Research: Overcoming the Scalability Problems of Quantum Device Manufacturing

Posted on March 10, 2026March 10, 2026

Denton Vacuum is currently conducting cutting-edge research on how its proprietary ion deposition processes could be used in the manufacturing of quantum computing devices. Denton’s research has the potential to transform the scalability and cost-effectiveness of quantum device production. The Challenge in Building Quantum Devices Building quantum devices demands specialized processes that can deposit ultrapure,… Read More

Improving Liftoff with Collimation Control

Posted on February 23, 2026February 13, 2026

There are many thin film applications that require a patterned coating, such as focal plane arrays with high-density pixels for LiDAR, video imaging and spectrometry. In such applications, a layer of photoresist material is placed on the surface of the wafer, masking the wafer so that only the desired areas are coated through the openings… Read More

The Impact of Grain Size on Thin Film Performance

Posted on January 6, 2026February 4, 2026

The grain size of a deposited thin film is directly affected by the method of deposition. While processing parameters such as deposition rate, film thickness, substrate temperature and vacuum pressure all have strong influences on the grain size of the resulting thin film, they are but secondary factors. The deposition method used has a much… Read More

Collage of lab pictures - semiconductor, laser, bendable screen, etc.

5 Challenges in Thin Film Manufacturing and How to Overcome Them

Posted on September 23, 2025September 23, 2025

Depositing consistent, high-quality thin films can be challenging. There are any number of factors that can affect yield and performance, but here are the top five challenges in thin film manufacturing: More importantly, there are actionable steps to take in overcoming these challenges in thin film production. Poor Adhesion and Delamination Delamination, where the thin… Read More

The Advantages of Denton’s Proprietary Thin Film Technology

Posted on May 5, 2025May 5, 2025

Denton’s multiple system platforms and its proprietary thin film process technologies enable Denton to deliver unique solutions tailored to customers’ specific applications. In particular, Denton’s proprietary ion energy plasma technologies are uniquely capable of helping semiconductor and nanotech companies produce low-damage, contamination-free, shift-free, ultra-thin and uniform films. Denton’s proprietary ion energy plasma technologies include: Endeavor… Read More

Wafer handling, solar panels, and optoelectronic laser

Improving Yield and Throughput in III-V Semiconductor Manufacturing

Posted on April 7, 2025April 7, 2025

Many of today’s electronic devices are based not on silicon semiconductors – the mainstay of the computer industry for decades – but on III-V semiconductors, built using specialized alloys with unique properties. However, the inherent cost, brittle nature, and unique characteristics of III-V semiconductors often demand special material handling during the manufacturing process. Denton offers… Read More

Peter Denton, Chairman of the Denton Vacuum Board

The Accidental Ion Source: A Discovery from a Failed Experiment

Posted on January 6, 2025April 4, 2025

For over half a decade, Denton Vacuum has developed deposition and etch technology that enable users to enhance and innovate their research techniques and manufacturing processes. Discovering ground-breaking technology is not always a straightforward path. It takes a willingness to try, fail, and try again. At Denton, we take pride in our willingness to fail… Read More

Close up of a system that uses magnetron sputtering

What is Magnetron Sputtering?

Posted on August 19, 2024November 18, 2024

Magnetron sputtering is a plasma-based technique for physical vapor deposition (or PVD) coating that creates dense films with good adhesion. It is excellent for depositing materials with high melting points that cannot be evaporated, and it has the highest scalability of any PVD type. Magnetron sputtering provides excellent precision in film thickness and density of… Read More

Close up of lasers reflecting in machines

Bias Target Sputtering for Thin Film Deposition

Posted on July 22, 2024November 25, 2024

Traditional ion beam sputtering (IBS) provides excellent control over ion energies and thin film stoichiometry, making it the process of choice for sputtering metals and dielectrics for applications such as vanadium oxide microbolometers and VCSELs. Still, IBS has various challenges in meeting the necessary standards for applications in which a high degree of precision and… Read More

Denton Vacuum magnetron sputtering illustration

Cathode Options for Magnetron Sputtering

Posted on June 17, 2024November 12, 2024

Magnetron sputtering is a versatile deposition technique that creates very dense films with good adhesion. It can easily deposit materials with high melting points that cannot be evaporated. Denton Vacuum’s magnetron sputtering systems are highly configurable with multiple cathode options to meet the specific requirements of different applications. In this article, we discuss the multiple… Read More