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With 28 patents and proprietary technologies centered around ion energy and plasma control, Denton Vacuum is uniquely capable of helping semiconductor and nanotech companies deposit low-damage, contamination-free, ultra-thin, and uniform films. In this month’s video, Denton’s Dr. David Douglass, Vice President Marketing and Technology, explains the importance of Denton’s ability to tune plasma ion energy… Read More
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In this month’s video, Denton’s Dr. David Douglass, Vice President Marketing and Technology, explains why Denton’s thin film systems are so flexible and easily adapted to suit precise customer needs. Talk to Denton today to see what we can build for you. One of the reasons Denton’s thin film systems are so flexible and easily… Read More
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Depositing consistent, high-quality thin films can be challenging. There are any number of factors that can affect yield and performance, but here are the top five challenges in thin film manufacturing: More importantly, there are actionable steps to take in overcoming these challenges in thin film production. Poor Adhesion and Delamination Delamination, where the thin… Read More
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Advanced thin films – incorporating innovative materials such as atomically thin graphene – are enabling breakthroughs in displays, photovoltaics, imaging, sensing and a host of other optoelectronic devices. This video focuses on graphene and transition metal dichalcogenides, or TMDs, but Denton’s deposition platforms support development and scalable implementation of not only graphene but also: Graphene… Read More
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Increasingly, fabricators undertaking whole chip delayering are turning to Broad Ion Beam Etching (IBE), which offers significant advantages over more traditional approaches in delayering today’s larger, denser, and more integrated semiconductors. As implemented in Denton’s Infinity FA, Broad IBE provides the necessary uniformity, minimal damage over large areas, and etch rate normalization across different materials… Read More
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In the intricate world of semiconductor manufacturing, understanding device failures and maintaining consistent quality is more than a technical challenge – it’s a critical business strategy. The smallest of quality issues can snowball to have an outsized impact on yield and profitability. Denton’s Infinity FA system can create automated, repeatable Failure Analysis (FA) and inline… Read More
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As the push for smarter, faster, and more energy-efficient optoelectronic devices intensifies, the role of innovative materials becomes increasingly important. From atomically thin graphene to multifunctional tandem structures, these advanced thin films are enabling breakthroughs in displays, photovoltaics, imaging, sensing and a host of other applications. This article explores some of the most promising materials… Read More
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Denton’s multiple system platforms and its proprietary thin film process technologies enable Denton to deliver unique solutions tailored to customers’ specific applications. In particular, Denton’s proprietary ion energy plasma technologies are uniquely capable of helping semiconductor and nanotech companies produce low-damage, contamination-free, shift-free, ultra-thin and uniform films. Denton’s proprietary ion energy plasma technologies include: Endeavor… Read More
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Many of today’s electronic devices are based not on silicon semiconductors – the mainstay of the computer industry for decades – but on III-V semiconductors, built using specialized alloys with unique properties. However, the inherent cost, brittle nature, and unique characteristics of III-V semiconductors often demand special material handling during the manufacturing process. Denton offers… Read More
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While traditional Ion Beam Sputtering (IBS) systems provide good process control, there are drawbacks for certain applications. Denton’s patented Biased Target Sputtering (BTS) can overcome many of the well-known process issues of IBS. In BTS, the low-energy ions generated are below the sputter threshold, and a negative voltage is applied to the target to ensure… Read More