See how Denton Vacuum has pioneered thin film for 6 decades.

Versatile, Turnkey Solutions for Magnetron Sputtering


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Denton offers a number of magnetron configurations to meet different application requirements. Magnetron sputtering is a highly versatile thin film deposition technique for coating films with excellent adhesion and high density. Magnetron sputtering is a plasma-based coating process where a magnetically confined plasma is created near the surface of a target material. Positively charged energetic… Read More

Pre-Cleaning in Thin Film Deposition

Woman in scrubs cleaning a thin film

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The global physical vapor deposition market is expected to expand at a compound annual growth rate (CAGR) of 7.5% from 2022 to 2030. The increasing demand for this process is due to the technological advancements in the industry. PVD films are used in applications for solar cells, optical & electrical components, automobiles, wear coatings, energy… Read More

The Benefits of Bias Target Sputtering

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Enabling Sputtering from the Target Only Bias Target Sputtering (BTS) has excellent process control and stoichiometry while reducing contamination and lowering cost of ownership. The ultralow contamination leads to higher performance in lasers and fewer defects enables higher laser damage threshold. BTS is also used for EUV mask blanks which must be defect-free or the… Read More

Denton’s Versa Cluster Platform Enables Greater Thin Film Production Efficiency

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The Versa cluster platform is an automated front-end option for high-volume manufacturing for thin film deposition operation with Denton’s ProcessPro-HV software. Versa is designed to work with 200 mm or 300 mm process modules and is compatible with Discovery sputter modules and the Voyager PE-CVD system. This cluster platform has features dedicated to sputter etch… Read More

Why PIB-CVD? Process Tunability

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The process tunability of PIB-CVD makes it optimal for many thin film applications. The inherent tunability of PIB-CVD enables a wide range of film properties including flowable, soft, thin film encapsulation layers as well as hard, highly hydrophobic, and optically clear coatings. As a result, multilayer and gradient coatings can be produced in a single chamber from… Read More

Why Semiconductor Manufacturers Prefer Denton’s Collaborative Approach

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Semiconductor manufacturing often takes a hardware-centric perspective when selecting equipment and vendors. However, manufacturers can benefit from a vendor’s industry experience and, instead, take an application-specific route. A partner like Denton Vacuum, with decades of experience, can address key concerns to get you to production faster than piecing together OEM parts. Working with a single vendor, or… Read More

SIMS Analytics for Semiconductors

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Secondary ion mass spectroscopy (SIMS) is a technique for compositional analysis of solid surfaces (such as semiconductors) in which material is removed from a surface by ion beam sputtering and the resultant positive and negative ions are analyzed in a mass spectrometer. This technique can be used to analyze the composition of semiconductor devices and… Read More

A Look Ahead at the Semiconductor Industry

2 robotic arms manufacturing a semiconductor

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Semicon West 2022 connected business and technology leaders, researchers, and industry analysts from across the microelectronics supply chain in California and online for their annual event. Here are some key takeaways from the conference. Semiconductor Market on Track to a Trillion The semiconductor industry faced several recent challenges and has seen disruptions. A crisis response… Read More

Plasma Matters

plasma ball rays in the dark

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What is plasma and why is it important in enabling thin film innovation? Plasma is the 4th state of matter after solid, liquid, and gas. Plasma contains a significant portion of charged particles, both ions and electrons. The presence of these charged particles makes plasma distinct from the other fundamental states of matter. Plasma is… Read More

Isoflux: The Optimal Choice for Ultrahigh Uniformity Flat Substrates

Diagram showing a cylindrical cathode configuration with the substrate inside the cathode, sputtering inward.

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Inverted cylindrical magnetron (ICM) sputtering is the optimal choice for applications that require ultra-uniform coatings on flat substrates. For example, ICM sputtering offers uniformity below 1% on standard 200mm wafers. ICM sputtering follows the same steps as conventional magnetron sputtering except a cylindrical cathode is used instead of a planar cathode. Instead of sputtering up… Read More