(Physical Vapor Deposition) The deposition of atoms or molecules that are vaporized from a solid or liquid
Posted on
Thin film coatings serve a number of purposes for different applications, including across the opto-electronics, display, semiconductor and medical fields. Here is a quick rundown of a number of common coatings that are available, their properties, and the applications they’re optimized for in order to help you figure out the best coating for your performance… Read More
Posted on
Grain size refers to the size of the individual crystallites or particles that compose a solid metal. Grain size, as well as the boundaries between the grains, are important factors for determining physical properties of the entire metal. In thin film deposition, if the particles are deposited with high energy, and there is a high… Read More
Posted on
With today’s technological advances, higher pixel density in focal plane arrays is a necessity as demand for improved visual quality goes up. Because of this, feature sizes on focal plane arrays are getting smaller, which requires higher density interconnects to bond the detector array to the readout chip. The current electroplating process just can’t deliver… Read More
Posted on
Ion beam deposition (IBD) is a thin film deposition method that produces the highest quality films with excellent precision. Also referred to as ion beam sputtering (IBS), it’s a process that’s used when tight control over film thickness and stoichiometry is needed. How it Works During the ion beam deposition process, an ion source is… Read More
Posted on
By adding an in-situ control or ion source to your thin film deposition system, you can achieve better performance and results, including higher yield and increased ROI. But how do you know which control choice is the right system addition for your application? In-Situ Controls In-situ controls allow you to observe the formation of thin… Read More
Posted on
There are several common types of thin film deposition techniques, with varying benefits depending on the method. But it’s not just the method that matters. Deposition source placement is one factor that can have a significant effect on thin film deposition. For sputtering, different cathode placement options can lead to different results for the thin… Read More
Posted on
Throughout the monitoring process, the system manufacturer and thin film engineer have several process choices to make regarding a number of factors. How do the different monitoring options affect the level of precision? Quartz Crystal vs. Optical Monitors Quartz crystal monitoring (QCM) is used to measure physical thickness while optical monitoring systems (OMS) measure optical… Read More
Posted on
Whether it’s coating a semiconductor chip with a protective thin film or applying anti-reflective coating to an eyeglass lens, process engineers have to achieve certain thickness specifications to meet performance requirements. Equally as important as the film thickness itself is the uniformity of the thickness. Achieving Uniformity for Performance Specs Without achieving proper thickness distribution,… Read More
Posted on
The most common types of physical vapor deposition (PVD) are magnetron sputtering and evaporation, which could be either thermal or electron beam (e-beam). How do you determine when to use which method? First, let’s take a look at how each one works. What is Magnetron Sputtering? Sputter deposition is excellent for materials with high melting… Read More