Denton Vacuum introduces its newest thin film technology offering — a system-integrated plasma emission monitor (PEM).
June 16, 2016
The Denton Vacuum PEM acquires real-time plasma emission spectra to help you control and monitor your reactive deposition processes, avoid target poisoning and maximize deposition rates. Providing an extended range (200 – 1000 nm), spectrometric-based optical sensor to precisely control reactive plasma processes, the Denton Vacuum PEM eliminates deposition guesswork and increases your sputter rates while depositing higher-quality films.
Fully integrated into the Denton Discovery sputtering tools, the PEM allows you to precisely manage power and reactive gas flow through auto-adjusting the gas setpoint, the PEM provides your process more efficiency, reducing incoming power requirements and cathode and substrate temperatures— avoiding sputtering from a poisoned target and eliminating possible damage to the target and to the magnets.
To read more about the full capability of this Denton Vacuum PEM, download our free whitepaper here.
Stop by the Denton Vacuum Booth 1508 at the Sensors Expo and Conference, June 21 through 23, 2016 at the McEnery Convention Center, San Jose, CA . See how Denton Vacuum can help you meet today’s sensing challenges and find tomorrow’s sensor solutions.