The Infinity FA System is a high-performance etching tool designed for failure analysis sample preparation, critical thin film profiling and delayering in semiconductor manufacturing. Ion beam etch (IBE), reactive ion beam etch (RIBE), and chemically assisted ion beam etch (CAIBE) are utilized to provide uniform etch rates for multi-material layers.
The system includes a robust SIMS package for analyzing thin film growth. It is ESD compliant and is fully computer controlled for high automation and repeatability. A secondary ion mass spectrometer (SIMS) enables precision endpoint control to delayer semiconductor wafers and identify defects, in order to improve process yield.