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Importance of Thickness Uniformity in Thin Film Deposition

camera lens

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Whether it’s coating a semiconductor chip with a protective thin film or applying anti-reflective coating to an eyeglass lens, process engineers have to achieve certain thickness specifications to meet performance requirements. Equally as important as the film thickness itself is the uniformity of the thickness. Achieving Uniformity for Performance Specs Without achieving proper thickness distribution,… Read More

Which PVD Method to Use: Magnetron Sputtering v. Evaporation

thin film deposition on substrate

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The most common types of physical vapor deposition (PVD) are magnetron sputtering and evaporation, which could be either thermal or electron beam (e-beam). How do you determine when to use which method? First, let’s take a look at how each one works. What is Magnetron Sputtering? Sputter deposition is excellent for materials with high melting… Read More