Achieving Repeatability in High-Volume Manufacturing

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Repeatability is a key factor in any production process. Along with uniformity, it ultimately determines the yield of any thin film deposition process. When designing a thin film system configuration for high-volume manufacturing, repeatability becomes especially paramount. Why is Repeatability Important? Accuracy (hitting the middle of a spec) and precision (repeatable results) are the two… Read More

Thin Film Considerations for High-Volume Manufacturing

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To scale smoothly into high-volume manufacturing, you need to be prepared to meet higher throughput requirements without impacting your process control. This means investing in the right thin film system configuration to meet your demanding throughput needs. Factors to Consider When selecting a thin film deposition system for high-volume production, there are a number of… Read More

Selecting the Right Front-end Option

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If you’re looking to improve productivity in your sputtering process, there are several front-end options available to use. When paired with a compatible standard sputter chamber, these front-end options can be used to increase throughput and production efficiency while providing consistent, repeatable results. Front-end Options Single Chamber, Single Wafer Loadport: This type of front-end option… Read More

Thin Film Solutions for the Semiconductor Market

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By the end of 2018, the semiconductor industry is expected to grow to $451 billion, an increase of 7.5% from 2017. With more innovative technology and electronic devices expected to reach the market within the next five to 10 years, semiconductor manufacturers should prepare for growth and examine production solutions for future applications, including thin… Read More