Posted on November 22, 2019April 28, 2022

One approach to cathode placement during sputtering is a planar configuration, in which the cathode is mounted directly above the substrate. This is the preferred method for applications where uniformity is paramount to performance. Benefits of Planar Cathode Placement When you mount the cathodes directly above the substrate during thin film deposition, you’ll achieve: Excellent… Read More

Posted on October 28, 2019December 11, 2019

During sputtering, there are several different approaches for cathode placement, depending on what you need to achieve from your process. Positioning the cathodes confocally to the substrate is the preferred method for co-sputtering multiple materials during deposition. Cathode Placement Approaches Where the cathode or cathodes are placed in relation to the substrate can have an… Read More