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Thin film deposition methods such as evaporation for indium bump deposition are often ideal for achieving good lift-off for patterned coatings. However, evaporation techniques can fall short of production needs for high-volume manufacturing. High-volume applications often require magnetron sputtering as a deposition method. The challenge for these manufacturers is to achieve good lift-off while meeting… Read More
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Laser Focus World recently released their annual report on the laser market, and there are some major industry trends that are expected to impact thin film deposition requirements. Manufacturers who focus on precision and performance for their thin film coatings will be best positioned to take advantage of expected growth. Laser Market Outlook According to… Read More
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Extreme ultraviolet (EUV) light requires a very complex process to produce, but this technology has major implications for lithography and nano-machining in semiconductor manufacturing. To ensure performance and precision during manufacturing, components of EUV systems must be produced with high-precision optics and coatings. What is Extreme Ultraviolet Light? Extreme UV light has wavelengths anywhere between… Read More
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One design consideration that can affect your process and thin film coating performance is the collective orientation of the substrate and cathodes during magnetron sputtering. Your system configuration may be oriented either horizontally or vertically, and both orientations have their benefits and tradeoffs. Vertical Sputtering: Benefits In a vertical sputtering configuration, the substrate and cathodes… Read More